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RE: Record cleaning water questions

Posted by pictureguy (A) on March 3, 2017 at 15:32:57

In Reply to: RE: Record cleaning water questions posted by PAR on February 28, 2017 at 14:40:36:

right you are.
At a semiconductor facility I worked at (actually 3 or 4 of 'em) we would flush our DI lines on a regular basis using Hydrogen Peroxide (high concentration) as well as change ALL filters.
Some usages had high intensity UV to 'kill' anything in the water at Point Of Use.

Purity is generally measured thru resistivity. 18MegaOhm is considered IT. We had processes that would rinse to a certain level. Usually 10 or 12 MegOhm was sufficient. This measured at the output of whatever was using the water, prior to the recovery drain.

A semiconductor manufacturing facility (a Fab) uses enough DI water in a single day to clean every record in the State Of California.
HUGE quantities.


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