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RE: Silicon dioxide

The picture on your website is that of an ingot of pure silicon, from which wafers are sliced and used for semiconductor manufacturing. Silicon dioxide is a film deposited on the wafers as part of the manufacturing process. It's primary function is an insulator (glass). The primary gas used for the growth of SiO2 is silane (SiH4).

So, while silicon dioxide is a layer, or film, formed during a deposition process, quartz is not utilized in the production of microprocessors. Silicon dioxide is formed through chemical reactions utilizing controlled pressure, heat, gas concentrations, and in some cases RF energy. At high enough temperatures the disassociation of the gasses can occur without the use of RF.

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